Arradiance Lands Order for Benchtop ALD/CVD Combination Tool
Nov 30, 2012 (Close-Up Media via COMTEX) --
Arradiance Inc. announced the receipt of an order for the industry's first benchtop ALD/CVD combination tool for metal deposition research.
According to a release, the new system's features minimize contamination and maximize process control. Capable of processing 200mm substrates using up to eight precursors, this new GEMStar system has the ability to achieve process temperatures of up to 400 C in either a pulsed or continuous controlled flow mode to offer the highest quality metal films available for researchers.
"This unique GEMSTAR-8 system combines the control of Atomic Layer Deposition with the speed and versatility of CVD in a compact benchtop unit perfect for material development in a controlled temperature (400 degrees C) and gas processing environment," said David Beaulieu, Arradiance Chief Operating Officer. "Metal deposition is of particular interest in markets such as semiconductors and alternative energy. Materials research in this area could lead to less expensive and more abundant energy in the future."
"Our unique experience and ground-breaking work with our patented ALD-activated, large area microchannel plates along with expertise in materials science, systems engineering and product development have all combined to make possible a truly robust research ALD system for scientists and engineers who are serious about results," says Ken Stenton, Arradiance CEO. "Because of the demand for expanding the materials that can be deposited using ALD we saw the need for a research tool with excellent film performance and system reliability at a size and cost to fit the research environment. We're confident the GEMStar-8 will exceed customer expectations."
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